CVD Equipment (NASDAQ:CVV) Shares Cross Above 200 Day Moving Average – What’s Next?

CVD Equipment Corporation (NASDAQ:CVV)’s stock price crossed above its 200-day moving average during trading on Friday . The stock has a 200-day moving average of $3.56 and traded as high as $4.20. CVD Equipment shares last traded at $4.11, with a volume of 82,525 shares trading hands.

Wall Street Analysts Forecast Growth

Separately, Weiss Ratings restated a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, the company has a consensus rating of “Sell”.

CVD Equipment Trading Up 5.1%

The firm has a 50 day moving average of $3.83 and a 200-day moving average of $3.56. The company has a market cap of $28.51 million, a P/E ratio of -205.40 and a beta of 0.97.

CVD Equipment (NASDAQ:CVV) last released its earnings results on Monday, November 10th. The industrial products company reported $0.06 earnings per share (EPS) for the quarter. The firm had revenue of $7.41 million for the quarter. CVD Equipment had a negative return on equity of 0.72% and a negative net margin of 0.66%.

Hedge Funds Weigh In On CVD Equipment

An institutional investor recently raised its position in CVD Equipment stock. Dimensional Fund Advisors LP increased its position in CVD Equipment Corporation (NASDAQ:CVV) by 5.2% in the third quarter, according to the company in its most recent Form 13F filing with the Securities and Exchange Commission (SEC). The fund owned 71,689 shares of the industrial products company’s stock after buying an additional 3,556 shares during the period. Dimensional Fund Advisors LP owned about 1.04% of CVD Equipment worth $241,000 as of its most recent SEC filing. Hedge funds and other institutional investors own 31.59% of the company’s stock.

CVD Equipment Company Profile

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.