CVD Equipment (NASDAQ:CVV) Share Price Passes Above 200 Day Moving Average – Here’s What Happened

CVD Equipment Corporation (NASDAQ:CVV)’s share price crossed above its two hundred day moving average during trading on Wednesday . The stock has a two hundred day moving average of $3.64 and traded as high as $4.97. CVD Equipment shares last traded at $4.62, with a volume of 100,395 shares trading hands.

Wall Street Analyst Weigh In

Separately, Weiss Ratings reiterated a “sell (e+)” rating on shares of CVD Equipment in a report on Wednesday, January 21st. One research analyst has rated the stock with a Sell rating, Based on data from MarketBeat.com, CVD Equipment currently has a consensus rating of “Sell”.

CVD Equipment Price Performance

The company has a market cap of $27.61 million, a PE ratio of -198.90 and a beta of 1.01. The business has a fifty day simple moving average of $4.24 and a two-hundred day simple moving average of $3.66.

Hedge Funds Weigh In On CVD Equipment

A number of large investors have recently added to or reduced their stakes in the company. DRW Securities LLC purchased a new stake in shares of CVD Equipment during the fourth quarter valued at about $45,000. Citadel Advisors LLC grew its position in shares of CVD Equipment by 93.6% in the 3rd quarter. Citadel Advisors LLC now owns 41,382 shares of the industrial products company’s stock worth $139,000 after buying an additional 20,011 shares during the last quarter. Finally, Dimensional Fund Advisors LP grew its position in shares of CVD Equipment by 5.2% in the 3rd quarter. Dimensional Fund Advisors LP now owns 71,689 shares of the industrial products company’s stock worth $241,000 after buying an additional 3,556 shares during the last quarter. 31.59% of the stock is currently owned by institutional investors.

About CVD Equipment

CVD Equipment Corporation (NASDAQ: CVV) designs, manufactures and markets custom vacuum deposition systems used to create thin-film coatings and advanced materials for semiconductor, optoelectronic and related industries. Established in 1992 and headquartered in the United States, the company leverages proprietary chemical vapor deposition (CVD), plasma-enhanced CVD, metal-organic CVD (MOCVD), atomic layer deposition (ALD) and physical vapor deposition (PVD) technologies to support both research and production applications.

The company’s product portfolio includes single- and multi-chamber reactors for the deposition of silicon, III-V compounds, metal oxides and other specialty materials, along with fluid-bed reactors for nanoparticle synthesis.